▶ 2003

    -. Dec.         Finished Development of MOS FET.

    -. Oct.          Finished Development of Electrostatic Chuck for Dry Etcher.

    -. Aug.         Signing Contract for MOS FET OEM Production.

   ▶ 2002

    -. Sep.         Finished Development of Upper electrode for LCD Dry Etcher.

   ▶ 2001

    -. Dec.         Completion of Anodizing factory.

   ▶ 2000

    -. Apr.          Registration of Venture Business.(Reg. No. 2000112441-2879)

   ▶ 1999

    -. Nov.         Acquisition of ISO 9002 certification.

 

   ▶ 1997

    -. Sep.         Official supply contract with Hynix Electronics Co., Ltd.

    -. Apr.          Official supply contract with Samsung Electronics Co., Ltd.

   ▶ 1996

    -. Sep.         Finished development of Cathode for Etcher.

   ▶ 1994                    

    -. Sep.         Established and launched business with

                       Samsung in Semiconductor Equipment Parts for

                       Dry Etcher, CVD, Sputter & Implanter.