Item : TEL CATHODE

Application equipment : Oxide Etcher

Material : SILICON

Process : DRY ETCHING

Application : Used as electrode of tel system for
                       spraying uniformly gas into the chamber

Features

    * Excellent properties are highly evaluated by the
       customers both domestics and abroad.

    
       - No particle during processing
       - No contamination during handling
       - Keeping high yield in process
       - Meet diversified customer's requirement of
         smaller deameter apertures

     
    * Gaurantee customer's delivery time

 Specifications

        - Material : Silicon Single Crystal
        - Orientation : <100 >
        - Carrier Type : P-Type(Boron Doped)
        - Purity of Silicon : 6N
                        (10ppm Heavy metal contamination)
        - Resistivity : 10 - 20 ohm-cm
        - Surface Treatment : Mirror Surface

  Contact : Kirim Semitec Co., Ltd
     Tel : 82-31-374-5725, 82-31-375-4065
     Fax : 82-31-375-1946
     e-mail : james@kirim-s.com

  If you have any question, please write us anytime
on click here to contact the manager James
on the above phone number.